METHOD FOR MANUFACTURING OF TWO-MIRROR ABERRATION-FREE AND APLANATIC SYSTEMS, WHICH MAIN MIRROR IS SHAPED AS SPHERICAL FRAGMENT

optical instruments. SUBSTANCE: method involves detection of shape of secondary mirror, which is designed as aspherical mirror surface, which is shaped as surface of revolution of algebraic flat function, which is calculated using precise generalized parametric equations. Current coordinates X and Y...

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Hauptverfasser: MEL'NIKOV G.S, POPOV A.S, GAN M.A
Format: Patent
Sprache:eng
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Zusammenfassung:optical instruments. SUBSTANCE: method involves detection of shape of secondary mirror, which is designed as aspherical mirror surface, which is shaped as surface of revolution of algebraic flat function, which is calculated using precise generalized parametric equations. Current coordinates X and Y are represented in resulting vector as sum of two vectors. The first vector has constant length, which is equal to sphere radius r, and rotates about sphere center with constant angular phase . Second vector has alternating length and rotates about end of first vector with current angular phase ( +alpha). Amplitude of second vector is proportional to variable s, which is calculated for rays of arbitrary reflection factor from main mirror under condition that length of ray travel from light source to given focus of two-mirror system is constant. This results in possibility to design two-mirror aberration- free and aplanatic systems, which may have arbitrary aperture up to 1:1. EFFECT: increased functional capabilities. 8 dwg