METHOD FOR PRODUCING PHOTORESIST COATINGS

METHOD FOR PRODUCING PHOTORESIST COATINGS

FIELD: microelectronics. SUBSTANCE: method involves coating substrate with some portion of photoresist and forming layer by rotating the substrate. During layer formation, analyzed section on reference plate is illuminated after three to five revolutions by bundle of parallel monochromatic rays, and...

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Hauptverfasser: POPOV G.V, VOLODIN R.A, BITJUKOV V.K, ABRAMOV G.V
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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creator POPOV G.V
VOLODIN R.A
BITJUKOV V.K
ABRAMOV G.V
description FIELD: microelectronics. SUBSTANCE: method involves coating substrate with some portion of photoresist and forming layer by rotating the substrate. During layer formation, analyzed section on reference plate is illuminated after three to five revolutions by bundle of parallel monochromatic rays, and time between maximums of intensity of light reflected from reference plate is recorded; this time is maintained during coating working plate with photoresist while varying angular velocity in proportion to ratio of respective time intervals between maximums of reflected light intensity for working and reference plates. EFFECT: improved reproducibility of layer obtained. 1 dwg, 1 tbl
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_RU2136077C1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>RU2136077C1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_RU2136077C13</originalsourceid><addsrcrecordid>eNrjZND0dQ3x8HdRcPMPUggI8ncJdfb0c1cI8PAP8Q9yDfYMDlFw9ncMAYoF8zCwpiXmFKfyQmluBgU31xBnD93Ugvz41OKCxOTUvNSS-KBQI0NjMwNzc2dDYyKUAAAFbSRj</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>METHOD FOR PRODUCING PHOTORESIST COATINGS</title><source>esp@cenet</source><creator>POPOV G.V ; VOLODIN R.A ; BITJUKOV V.K ; ABRAMOV G.V</creator><creatorcontrib>POPOV G.V ; VOLODIN R.A ; BITJUKOV V.K ; ABRAMOV G.V</creatorcontrib><description>FIELD: microelectronics. SUBSTANCE: method involves coating substrate with some portion of photoresist and forming layer by rotating the substrate. During layer formation, analyzed section on reference plate is illuminated after three to five revolutions by bundle of parallel monochromatic rays, and time between maximums of intensity of light reflected from reference plate is recorded; this time is maintained during coating working plate with photoresist while varying angular velocity in proportion to ratio of respective time intervals between maximums of reflected light intensity for working and reference plates. EFFECT: improved reproducibility of layer obtained. 1 dwg, 1 tbl</description><edition>6</edition><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>1999</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19990827&amp;DB=EPODOC&amp;CC=RU&amp;NR=2136077C1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19990827&amp;DB=EPODOC&amp;CC=RU&amp;NR=2136077C1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>POPOV G.V</creatorcontrib><creatorcontrib>VOLODIN R.A</creatorcontrib><creatorcontrib>BITJUKOV V.K</creatorcontrib><creatorcontrib>ABRAMOV G.V</creatorcontrib><title>METHOD FOR PRODUCING PHOTORESIST COATINGS</title><description>FIELD: microelectronics. SUBSTANCE: method involves coating substrate with some portion of photoresist and forming layer by rotating the substrate. During layer formation, analyzed section on reference plate is illuminated after three to five revolutions by bundle of parallel monochromatic rays, and time between maximums of intensity of light reflected from reference plate is recorded; this time is maintained during coating working plate with photoresist while varying angular velocity in proportion to ratio of respective time intervals between maximums of reflected light intensity for working and reference plates. EFFECT: improved reproducibility of layer obtained. 1 dwg, 1 tbl</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1999</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZND0dQ3x8HdRcPMPUggI8ncJdfb0c1cI8PAP8Q9yDfYMDlFw9ncMAYoF8zCwpiXmFKfyQmluBgU31xBnD93Ugvz41OKCxOTUvNSS-KBQI0NjMwNzc2dDYyKUAAAFbSRj</recordid><startdate>19990827</startdate><enddate>19990827</enddate><creator>POPOV G.V</creator><creator>VOLODIN R.A</creator><creator>BITJUKOV V.K</creator><creator>ABRAMOV G.V</creator><scope>EVB</scope></search><sort><creationdate>19990827</creationdate><title>METHOD FOR PRODUCING PHOTORESIST COATINGS</title><author>POPOV G.V ; VOLODIN R.A ; BITJUKOV V.K ; ABRAMOV G.V</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_RU2136077C13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1999</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>POPOV G.V</creatorcontrib><creatorcontrib>VOLODIN R.A</creatorcontrib><creatorcontrib>BITJUKOV V.K</creatorcontrib><creatorcontrib>ABRAMOV G.V</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>POPOV G.V</au><au>VOLODIN R.A</au><au>BITJUKOV V.K</au><au>ABRAMOV G.V</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>METHOD FOR PRODUCING PHOTORESIST COATINGS</title><date>1999-08-27</date><risdate>1999</risdate><abstract>FIELD: microelectronics. SUBSTANCE: method involves coating substrate with some portion of photoresist and forming layer by rotating the substrate. During layer formation, analyzed section on reference plate is illuminated after three to five revolutions by bundle of parallel monochromatic rays, and time between maximums of intensity of light reflected from reference plate is recorded; this time is maintained during coating working plate with photoresist while varying angular velocity in proportion to ratio of respective time intervals between maximums of reflected light intensity for working and reference plates. EFFECT: improved reproducibility of layer obtained. 1 dwg, 1 tbl</abstract><edition>6</edition><oa>free_for_read</oa></addata></record>
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title METHOD FOR PRODUCING PHOTORESIST COATINGS
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-10T13%3A07%3A30IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=POPOV%20G.V&rft.date=1999-08-27&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ERU2136077C1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true