METHOD FOR PRODUCING PHOTORESIST COATINGS

FIELD: microelectronics. SUBSTANCE: method involves coating substrate with some portion of photoresist and forming layer by rotating the substrate. During layer formation, analyzed section on reference plate is illuminated after three to five revolutions by bundle of parallel monochromatic rays, and...

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Bibliographische Detailangaben
Hauptverfasser:	POPOV G.V, VOLODIN R.A, BITJUKOV V.K, ABRAMOV G.V
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	FIELD: microelectronics. SUBSTANCE: method involves coating substrate with some portion of photoresist and forming layer by rotating the substrate. During layer formation, analyzed section on reference plate is illuminated after three to five revolutions by bundle of parallel monochromatic rays, and time between maximums of intensity of light reflected from reference plate is recorded; this time is maintained during coating working plate with photoresist while varying angular velocity in proportion to ratio of respective time intervals between maximums of reflected light intensity for working and reference plates. EFFECT: improved reproducibility of layer obtained. 1 dwg, 1 tbl