APPARATUS FOR MOLECULAR-BEAM EPITAXY

FIELD: vacuum technics. SUBSTANCE: invention is designed for application in thin-film multilayer coating technology. Apparatus contains vacuum process chamber enclosing annular diffusers placed opposite to carrier, material vapor-supply systems connecting annular diffusers with material vapor sources, carrier-displacement manipulator, and cooled screens. Annular diffusers are installed coaxially in the form of packet. Material vapor sources mounted outside the chamber are provided with loading systems for materials being vaporized and supply systems for gaseous organometallic compounds. Annular diffuser chamber encloses throttle grill separating it into two annular chambers. To the process chamber connected are transfer cells enclosing loading systems for materials being vaporized. The latter, in turn, incorporate solid material vapor sources provided with closing facilities, vapor duct- or annular diffuser-docking adapters, and, connected with transfer cell, vacuum putting-into- operation devices with drives providing displacement of the above- indicated docking adapters. EFFECT: improved structure. 13 cl, 8 dwg