DIFFRACTION PATTERN FOR ULTRAVIOLET AND X-RAY RADIATION

FIELD: X-ray equipment, in particular, X-ray spectrometers. SUBSTANCE: device has substrate which is covered with structure of alternating layers of at least two materials of different electromagnetic permeability. Said structure of layers is cut at angle to surface. Roughness of substrate is greate...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	ZUBAREV EVGENIJ NIKOLAEVICH, VINOGRADOV ALEKSANDR VLADIMIROVICH, FEDORENKO ANATOLIJ IVANOVICH, JULIN SERGEJ ANATOL'EVICH, KONDRATENKO VALERIJ VLADIMIROVICH, LEVASHOV VLADIMIR EVGEN'EVICH
Format:	Patent
Sprache:	eng
Schlagworte:	OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PHYSICS
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