DIFFRACTION PATTERN FOR ULTRAVIOLET AND X-RAY RADIATION

DIFFRACTION PATTERN FOR ULTRAVIOLET AND X-RAY RADIATION

FIELD: X-ray equipment, in particular, X-ray spectrometers. SUBSTANCE: device has substrate which is covered with structure of alternating layers of at least two materials of different electromagnetic permeability. Said structure of layers is cut at angle to surface. Roughness of substrate is greate...

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Hauptverfasser: ZUBAREV EVGENIJ NIKOLAEVICH, VINOGRADOV ALEKSANDR VLADIMIROVICH, FEDORENKO ANATOLIJ IVANOVICH, JULIN SERGEJ ANATOL'EVICH, KONDRATENKO VALERIJ VLADIMIROVICH, LEVASHOV VLADIMIR EVGEN'EVICH
Format: Patent
Sprache:eng
Schlagworte:
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
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Beschreibung
Zusammenfassung:FIELD: X-ray equipment, in particular, X-ray spectrometers. SUBSTANCE: device has substrate which is covered with structure of alternating layers of at least two materials of different electromagnetic permeability. Said structure of layers is cut at angle to surface. Roughness of substrate is greater than $$$, where h is period of structure. Diffraction pattern cut surface has either complex shape or concavity. Substrate shape is concave. EFFECT: increased functional capabilities. 4 cl, 1 dwg øøø1