DEVICE FOR CLEANING OF INERT GAS
FIELD: devices for cleaning inert gases (krypton, xenon, argon and others) from gaseous impurities such as nitrogen, oxygen, hydrogen, carbon dioxide gas, etc by their absorption with solid absorbent (sponge titanium or other getters) in chemical, metallurgical, mechanical engineering and other indu...
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Format: | Patent |
Sprache: | eng ; rus |
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Zusammenfassung: | FIELD: devices for cleaning inert gases (krypton, xenon, argon and others) from gaseous impurities such as nitrogen, oxygen, hydrogen, carbon dioxide gas, etc by their absorption with solid absorbent (sponge titanium or other getters) in chemical, metallurgical, mechanical engineering and other industries. SUBSTANCE: device includes heatproof body with removable cover and bottom in which internal cylindrical retort with perforated bottom is installed. Internal cylindrical retort is located coaxially in external retort to form annular gap for passage of cleaned gas. External retort lower half is filled with alternating layers of solid absorbent with packing and without it. Packing is presented in the form of left-hand or right-hand spiral from metal band with absorbent poured into slotted gaps. Heater encased in its own casing is located inside device body, on external surface of external retort. Body also has heat exchanger mounted in upper half of internal retort and presents shielded heat insulator with trays polished in direction of gas motion. Body has process branch pipes located on external retort surface protruding above body cover. EFFECT: higher cleaning depth of inert gas to 0.5x10 -1x10 % vol, reduced power consumption, possibility of cleaning of inert gases of particular value, simple maintenance and operation, reduced overall dimensions, provision of ecological safety in operation. 2 cl, 1 dwgt |
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