PHOTOPOLYMERIZING COMPOSITION FOR PREPARING OF MATRIX PROTECTIVE RELIEF FOR GALVANOPLASTIC ACCUMULATING

Bibliographische Detailangaben

Hauptverfasser:	ALEKSANDROVA L.N, TARANETS V.P, TREUSHNIKOV V.M, OLEJNIK A.V, KALASHNIKOV B.P, ESIN S.A, GUSARSKAYA N.L, POMERANTSEVA L.L
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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