METHOD OF ENHANCING SURFACE PROPERTIES OF KAOLINITE BY ATMOSPHERIC-PRESSURE PLASMA PROCESSING

The invention relates to a plasma source and to a method for enhancing the kaolinite surface properties by atmospheric-pressure plasma processing. According to the invention, the plasma source comprises an external body consisting of a component (6) representing a detachable metal cover which also h...

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Hauptverfasser: EPURESCU GEORGE- NICOLAE, LAZEA STOYANOVA ANDRADA, DUMITRESCU LUMINIŢA- NICOLETA, IONIŢĂ EUSEBIU ROSINI, IONIŢĂ MARIA DANIELA
Format: Patent
Sprache:eng ; rum
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Zusammenfassung:The invention relates to a plasma source and to a method for enhancing the kaolinite surface properties by atmospheric-pressure plasma processing. According to the invention, the plasma source comprises an external body consisting of a component (6) representing a detachable metal cover which also has the role of an electromagnetic screen and a component (7) with the role of support for the rest of the components which also acts as a ground electrode, a "hot" electrode (8) on which the voltage is applied, both electrodes (7 and 8) being plan-parallel and trapezoidal-shaped, with the small base in a plasma-jet discharge zone, where, between the two electrodes (7 and 8) there are mounted some components (9 and 10) which are ceramic dielectric plan-parallel trapezoidal barriers oriented in the same way as the electrodes (7 and 8) and spaced apart by another component (11) to form a discharge space (12), a component (13) to which a gas hose, argon in this case, is connected, a component (14) consisting of a standard connector for safely supplying the electrode (8) with high voltage, where the source may be power-supplied in various modes: with high-voltage pulsed direct current, with high-voltage low-frequency alternating current or with radiofrequency alternating current, in high frequency range, and the supply of the working gas is made by means of a gas flow-rate controller. The claimed method for enhancing the kaolinite film surface properties consists in using a plasma jet source at atmospheric pressure, generated in a discharge configuration with dielectric barrier, as claimed by the invention, the processing being achieved by sweeping with the plasma jet on the film surface. Invenţia se referă la o sursă de plasmă şi la o metodă de îmbunătăţire a proprietăţilor de suprafaţă a caolinitului prin procesare cu plasmă la presiune atmosferică. Sursa de plasmă, conform invenţiei, cuprinde: un corp exterior, constituit dintr-o componentă (6) reprezentând un capac metalic detaşabil având şi rol de ecran electromagnetic şi dintr-o componentă (7) ce are rol de suport pentru restul componentelor, dar ţine loc şi de electrod de masă, un electrod (8) "cald", pe care se aplică tensiunea, ambii electrozi (7 şi 8) fiind plan-paraleli şi având formă trapezoidală, cu baza mică într-o zonă de evacuare a jetului de plasmă, între cei doi electrozi (7 şi 8) fiind montate nişte componente (9 şi 10) reprezentând bariere plan-paralele, dielectrice, ceramice, de formă trapezoidal