INTEGRATION OF NANO AND MICRO TEXT ELEMENTS INTO THE STRUCTURE OF LABELS OR HOLOGRAPHIC MICROPARTICLES IN ORDER TO INCREASE THE LEVEL OF SECURITY
The invention relates to two processes for integrating nano and micro text elements in the structure of labels or holographic microparticles in order to increase the security level of labels, foils or stickers which are applied on various products. According to the invention, the first process has t...
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Zusammenfassung: | The invention relates to two processes for integrating nano and micro text elements in the structure of labels or holographic microparticles in order to increase the security level of labels, foils or stickers which are applied on various products. According to the invention, the first process has the following steps: a Ni foil with a thickness between 5 ... 10 μm, which contains diffractive optical elements on the surface, is cleaned by removing the organic contaminants and impurities by repeatedly rinsing it in acetone and isopropyl alcohol, is dried with nitrogen, dehydrated by heat treatment at 100°C for 5 min., successive spreading with positive photoresist, on both sides of the Ni foil, with a resist thickness of 1.4 μm treated in convection thermal oven at a temperature of 90°C for 15 min, exposing the photoresist layer to UV radiation with a wavelength of 405 nm for 3 s, through a Cr mask, removing the photoresist in a KOH-based developer solution, corroding the Ni foil in a solution of HNO: CHCOOH: HSO4: ADI (5:5:2:1) at cold for 3 min, rinsing with deionized water, drying with Nand removing the photoresist in acetone heated to 45°C. According to the invention, the second process consists in depositing a positive photoresist layer of 2.5 μm, by centrifugation at 1500 rpm, for 30 s, on the surface of a glass plate coated with a metallic Cr layer of 20 mm, heat treatment at 95°C for 45 min, exposing the diffractive optical elements by holographic lithography, aligning and exposing the alphanumeric elements by direct laser writing with a wavelength of 402 nm, removing the photoresist in aqueous solution of AZ 400k for 35 s, depositing a Ag layer of 50 nm, electroforming a Ni layer for 6 hours, chemically removing the NiAg layer from the glass plate by immersion in aqueous solution, depositing the primary Ni layer, mechanically detaching the Ni shim and printing in holographic foil.
Invenţia se referă la două procedee de integrare a elementelor de nano- şi microtext în structura etichetelor sau a microparticulelor holografice, pentru creşterea nivelului de securitate a etichetelor, foliilor sau autocolantelor care sunt aplicate pe diferite produse. Procedeul 1 conform invenţiei are următoarele etape: o folie de Ni cu gosimea cuprinsă între 5...10 μm, care conţine pe suprafaţă elemente optice difractive, se curăţă de contaminanţi organici şi impurităţi prin clătiri repetate în acetonă şi alcool isopropilic, se usucă cu azot, se deshidratează printr-un |
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