ULTRASONIC VAPOUR GENERATOR FOR SYNTHESIS OF NP/NS BY LASER PYROLYSIS

The invention relates to an ultrasonic vapour generator for the synthesis of nanoparticles/nanostructures with photocatalytic properties. According to the invention, the device comprises a laser source (SL), in connection with a serial circuit (CR) for direct cooling of a piezoelectric transducer (P...

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Bibliographische Detailangaben
Hauptverfasser: POPOVICI ERNEST, MIRON DAN, GAVRILĂ FLORESCU CARMEN LAVINIA
Format: Patent
Sprache:eng ; rum
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Zusammenfassung:The invention relates to an ultrasonic vapour generator for the synthesis of nanoparticles/nanostructures with photocatalytic properties. According to the invention, the device comprises a laser source (SL), in connection with a serial circuit (CR) for direct cooling of a piezoelectric transducer (PET) and indirect cooling of a vaporization chamber (PV) confined by a membrane (5) transparent to ultrasounds, a thermal processing enclosure (3), an injector (2) for fluid injection into the enclosure (3), a unit (PETCU) for controlling the piezoelectric transducer (PET), a unit (GFCU) for controlling the gas flow rate, a unit (CLC) for controlling the capacitive level of the process liquid (PL), the control units being managed by a computerized system (MPCU). Invenţia se referă la un generator de vapori cu ultrasunete pentru sinteza de nanoparticule/nanostructuri cu proprietăţi fotocatalitice. Dispozitivul conform invenţiei este format dintr-o sursă (SL) laser, în legătură cu un circuit în serie (CR) de răcire directă a unui traductor piezoelectric (PET) şi indirectă a unei camere (PV) de vaporizare, delimitate de o membrană (5) transparentă la ultrasunete, o incintă (3) de procesare termică, un injector (2) pentru introducerea fluidului în incintă (3), o unitate (PETCU) de control a traductorului piezoelectric (PET), o unitate (GFCU) de control debit gaze, o unitate (CLC) de control nivel capacitiv a lichidului (PL) de proces, unităţile de control fiind gestionate de un sistem (MPCU) computerizat.