A SYSTEM FOR SATURATING LIQUIDS WITH GAS AND A METHOD FOR SATURATING LIQUIDS WITH GAS USING THIS SYSTEM

The subject of the invention is a liquid with gas saturation system comprising of a liquid source (3), a gas source (5), a gas dissolution chamber (1) and a liquid receiving tank (4), where the liquid source (3) is connected by means of a pipeline (11) equipped in the pump (8) with the cavitation sy...

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Bibliographische Detailangaben
Hauptverfasser: FILIP MARIUSZ HERMAN, ALEKSANDER WIDUCH
Format: Patent
Sprache:eng ; por
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Beschreibung
Zusammenfassung:The subject of the invention is a liquid with gas saturation system comprising of a liquid source (3), a gas source (5), a gas dissolution chamber (1) and a liquid receiving tank (4), where the liquid source (3) is connected by means of a pipeline (11) equipped in the pump (8) with the cavitation system (14) which is connected via a pipeline (16) to the gas dissolution chamber (1), where the end of the pipeline (16) is a set of atomizing nozzles (7) located in the gas dissolution chamber (1) to which a gas source (5) is connected via a gas pipeline (10) with a nozzle (6); and the gas dissolution chamber (1) by means of a pipeline (12) with a control valve (9) is connected to a retention chamber (2) with alternately arranged, partly open partitions (17), which via a pipeline (13) with a valve (15) is connected to the saturated liquid receiving tank (4). The method of saturating the liquid with gas using the above system, where the liquid from the liquid source (3) is pumped by means of a pump (8), raising the liquid pressure to at least 4 bar, through the pipeline (11), to the cavitation system (14) where liquid is saturated with the gas in the form of micro-nano bubbles and then through a pipeline (10) it is pumped into a set of atomizing nozzles (7) with the help of which the liquid is sprayed in the gas dissolution chamber (1), where the liquid is additionally saturated with gas coming from a gas source (5 ) fed via the gas pipeline (10) and nozzle (6), where the gas is supplied with a pressure equal to the liquid pressure, then via the pipeline (12) the liquid is pumped into the retention chamber (2) through which it flows in not less than 13 minutes and the line speed not exceeding 0.5 m/s necessary to dissolve the gas is then pumped through the pipeline (13) to the liquid receiving tank (4).