METHOD FOR REMOVING IMPURITIES FROM SILICON-CONTAINING RESIDUES

The present invention relates to a method for removing impurities from elemental silicon-containing residues from the processes of producing organochlorosilane and chlorosilane. The residues are subjected to magnetic separation to provide a relative pure non-magnetic fraction having an increased sil...

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Bibliographische Detailangaben
Hauptverfasser:	HAAVARD SORHEIM, HARALD ARNLJOT OYE, HARRY MORTEN RONG
Format:	Patent
Sprache:	eng ; por
Schlagworte:	ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM CHEMISTRY COMPOUNDS THEREOF INORGANIC CHEMISTRY MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLIDMATERIALS OR FLUIDS MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROMSOLID MATERIALS OR FLUIDS METALLURGY NON-METALLIC ELEMENTS ORGANIC CHEMISTRY PERFORMING OPERATIONS SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATICTABLES OR JIGS TRANSPORTING
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Beschreibung
Zusammenfassung:	The present invention relates to a method for removing impurities from elemental silicon-containing residues from the processes of producing organochlorosilane and chlorosilane. The residues are subjected to magnetic separation to provide a relative pure non-magnetic fraction having an increased silicon content and a relatively impure magnetic fraction having a lower silicon content than the non-magnetic fraction.