PROJECTION OPTICAL UNIT FOR MICROLITHOGRAPHY AND METHOD FOR PRODUCING A STRUCTURED COMPONENT

A projection optical unit for microlithography includes a plurality of mirrors and has a numerical aperture having a value larger than 0.5. The plurality of mirrors includes at least three grazing incidence mirrors, which deflect a chief ray of a central object field point with an angle of incidence...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	MUENZ, HOLGER, ROSTALSKI, HANS JÜRGEN, MENKE, CHRISTOPH
Format:	Patent
Sprache:	eng ; pol
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	A projection optical unit for microlithography includes a plurality of mirrors and has a numerical aperture having a value larger than 0.5. The plurality of mirrors includes at least three grazing incidence mirrors, which deflect a chief ray of a central object field point with an angle of incidence of greater than 45°. Different polarized light beams passing the projection optical unit are rotated in their polarization direction by different angles of rotation. The projection optical unit includes first and second groups of mirrors. The second group of mirrors includes the final two mirrors of the plurality of mirrors at the image side. A linear portion in the pupil dependence of the total geometrical polarization rotation of the projection optical unit is less than 20% of a linear portion in the pupil dependence of the geometrical polarization rotation of the second group of mirrors.