ELECTRICALLY CONDUCTIVE CARRIER FOR A GLAZING UNIT WITH VARIABLE LIQUID-CRYSTAL-INDUCED SCATTERING, AND SUCH A GLAZING UNIT

An electrically conductive support for a glazing unit having liquid crystal scattering properties may include a multilayer of thin films. In one example, the thin films include an electrode comprising a TCO film, a silicon-nitride-based first barrier film having a thickness e1 of at least 5 nm, and...

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Bibliographische Detailangaben
Hauptverfasser:	STERNCHUSS, JULIETTE, ALSCHINGER, MATTHIAS, LETOCART, PHILIPPE, ZHANG, JINGWEI
Format:	Patent
Sprache:	eng ; pol
Schlagworte:	CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMISTRY DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING FREQUENCY-CHANGING GLASS JOINING GLASS TO GLASS OR OTHER MATERIALS METALLURGY MINERAL OR SLAG WOOL NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS PHYSICS SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Beschreibung
Zusammenfassung:	An electrically conductive support for a glazing unit having liquid crystal scattering properties may include a multilayer of thin films. In one example, the thin films include an electrode comprising a TCO film, a silicon-nitride-based first barrier film having a thickness e1 of at least 5 nm, and a silicon-oxide-based second barrier film having a thickness e2 of at least 30 nm. The thickness e1 may be smaller than or equal to e2 and/or smaller than 80 nm. Further, the cumulative thickness of the first and second barrier films may be larger than or equal to 50 nm and smaller than 150 nm.