Apparatus and method for controlling the flow rate of a cryogenic liquid
A nozzle and process are set forth for contacting a cryogenic liquid and a gas, and discharging the resulting fluid through the nozzle. In one embodiment, the ratio of the discharged fluid's liquid component to its gaseous component is controlled as a function of the gas pressure.
Gespeichert in:
Hauptverfasser: | , , |
---|---|
Format: | Patent |
Sprache: | eng ; pol |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | A nozzle and process are set forth for contacting a cryogenic liquid and a gas, and discharging the resulting fluid through the nozzle. In one embodiment, the ratio of the discharged fluid's liquid component to its gaseous component is controlled as a function of the gas pressure. |
---|