Apparatus and method for controlling the flow rate of a cryogenic liquid

A nozzle and process are set forth for contacting a cryogenic liquid and a gas, and discharging the resulting fluid through the nozzle. In one embodiment, the ratio of the discharged fluid's liquid component to its gaseous component is controlled as a function of the gas pressure.

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Bibliographische Detailangaben
Hauptverfasser: GREEN, JOHN LEWIS, ZURECKI, ZBIGNIEW, KNORR, ROBERT ELLSWORTH
Format: Patent
Sprache:eng ; pol
Schlagworte:
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Beschreibung
Zusammenfassung:A nozzle and process are set forth for contacting a cryogenic liquid and a gas, and discharging the resulting fluid through the nozzle. In one embodiment, the ratio of the discharged fluid's liquid component to its gaseous component is controlled as a function of the gas pressure.