WIDEBAND ANTIREFLEX STRIP WIRH SILICON OR GERMANIUM SUBSTRATE

WIDEBAND ANTIREFLEX STRIP WIRH SILICON OR GERMANIUM SUBSTRATE

Broadband antireflection coating on a silicon or germanium base, consisting of a few layers of known infrared transparent materials, by means of vapour deposition, characterised in that on the side of substrate it consists of a layer sequence of silicon, germanium, the second layer of silicon, alumi...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: SNIADEK EDMUND, CHOROMANSKI ZDZISLAW, FIRAK JOZEF, POLOSZYK STANISLAW
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:Broadband antireflection coating on a silicon or germanium base, consisting of a few layers of known infrared transparent materials, by means of vapour deposition, characterised in that on the side of substrate it consists of a layer sequence of silicon, germanium, the second layer of silicon, aluminium oxide, magnesium fluoride and the second layer of aluminium oxide, constituting the external layer of the coating, however, phase thickness of each of the component layers of the coating is within the limits from O to π/4.