POLISHING FLUID COMPOSITION FOR GLASS HARD DISC SUBSTRATES

Provided is a polishing fluid composition for glass hard disc substrates which combines a high polish rate and high cleanliness and which, even when used in a fluid-circulating polishing system, can keep a high polish rate for a long time. A polishing fluid composition for glass hard disc substrates...

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Bibliographische Detailangaben
1. Verfasser:	DOI Haruhiko
Format:	Patent
Sprache:	eng
Schlagworte:	ADHESIVES CHEMISTRY DRESSING OR CONDITIONING OF ABRADING SURFACES DYES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING INFORMATION STORAGE INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS PERFORMING OPERATIONS PHYSICS POLISHES POLISHING TRANSPORTING
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Beschreibung
Zusammenfassung:	Provided is a polishing fluid composition for glass hard disc substrates which combines a high polish rate and high cleanliness and which, even when used in a fluid-circulating polishing system, can keep a high polish rate for a long time. A polishing fluid composition for glass hard disc substrates which comprises an amine compound, an acid, silica particles, and water, wherein the amine compound is selected from the group consisting of amino alcohols, piperazine, and derivatives thereof and contains two or three nitrogen atoms in the molecule, at least one of the nitrogen atoms being in the form of a primary or secondary amine.