Fremgangsmåte for fremstilling av silisiumnitrid

The present invention provides a process for the production of silicon nitride by the reaction of silicon and nitrogen, wherein, in one reaction step, silicon powder is reacted with nitrogen which continuously rotates at a temperature of from 1000 DEG to 1800 DEG C. and at a pressure of from 1.01 to...

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Bibliographische Detailangaben
Hauptverfasser: HINTERMAYER, JOCHEN, SCHROLL, GEORG, GRAF, ERNST, GMOEHLING, WERNER, KOBLER, WOLFGANG
Format: Patent
Sprache:nor
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Beschreibung
Zusammenfassung:The present invention provides a process for the production of silicon nitride by the reaction of silicon and nitrogen, wherein, in one reaction step, silicon powder is reacted with nitrogen which continuously rotates at a temperature of from 1000 DEG to 1800 DEG C. and at a pressure of from 1.01 to 1.8 bar up to a nitrogen content of 1 to 39.5% by weight. The present invention also provides a silicon nitride produced by this process wherein it is obtained in porous form and has the following properties. a) grain size of 0.1 to 20 mm. b) nitrogen content of 1 to 39.5% by weight, c) oxygen content of 1%, d) ratio of alpha : beta -phase of 1:9 to 9:1.