SELF-ALIGNED VIA PATTERNING FOR BACKSIDE INTERCONNECTS

Devices, transistor structures, systems, and techniques are described herein related to coupling backside and frontside metallization layers that are on opposite sides of a device layer. A device includes a transistor having semiconductor structures extending between a source and a drain, and a gate...

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Bibliographische Detailangaben
Hauptverfasser: LEONARD GULER, MAKRAM ABD EL QADER, CHANAKA MUNASINGHE, PRATIK PATEL, ANINDYA DASGUPTA, REZA BAYATI, SIKANDAR ABBAS, MADELEINE STOLT
Format: Patent
Sprache:eng
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