System and process for imprinting

The invention relates to a system for imprinting, in particular nanoimprinting, comprising at least one substantially flexible stamp configured for imprinting, in particular nanoimprinting, at least one roller configured for exerting pressure onto at least one substantially flexible stamp and/or at...

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Bibliographische Detailangaben
Hauptverfasser:	ROB ANTONIUS WALTHERUS NEELEN, JAN MATTHIJS TER MEULEN
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The invention relates to a system for imprinting, in particular nanoimprinting, comprising at least one substantially flexible stamp configured for imprinting, in particular nanoimprinting, at least one roller configured for exerting pressure onto at least one substantially flexible stamp and/or at least one substrate which is to be imprinted and at least one stage configured for providing support to at least one substrate during imprinting, wherein at least one roller and at least one stage are mutually displaceable in at least an imprint direction in particular such that imprinting is facilitated and wherein the system comprises at least one connector which is configured to improve the alignment before and during imprinting.