PROCESS FOR PREPARING HIGH-PURITY TRIMETHYLMETHOXYSILANE

The invention provides a preparation process of high-purity trimethylmethoxysilane and belongs to the technical field of silane new materials. The preparation process comprises the following steps: mixing sodium methylate With a solvent, reducing the temperature by using an ice bath, dropwise adding...

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Hauptverfasser: XIAO QI, PENGTAO LI, FANZHEN KONG, SHILIN QI, TIANTIAN YANG, YUAN QU, HANGHANG LI
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:The invention provides a preparation process of high-purity trimethylmethoxysilane and belongs to the technical field of silane new materials. The preparation process comprises the following steps: mixing sodium methylate With a solvent, reducing the temperature by using an ice bath, dropwise adding trimethylchlorosilane and controlling the temperature at 0-50°C, after the completion of dropwise addition of trimethylchlorosilane, increasing the temperature to 60-100°C, continuing the reaction for 0.5-4h, after the completion of reaction, centrifuging, taking a supernatant and performing rectification to obtain the high-purity trimethylmethoxysilane. In the preparation process of the high-purity trimethylmethoxysilane, by replacing traditional methanol with the sodium methylate, salt is generated and, no hydrochloric acid or hydrogen chloride gas is generated in the reaction process; the preparation process has the advantages of easiness in product separation, low requirements on equipment quality5 capability of recycling a solvent in the reaction process, mild reaction conditions and high product yield, the product yield can reach as high as 90% and the product content reaches 99% or above after distillation.