CONTAMINATION TRAP

A contamination trap for use in a debris mitigation system of a radiation source, the contamination trap comprising a plurality of vanes configured to trap fuel debris emitted from a plasma formation region of the radiation source; wherein at least one vane or each vane of the plurality of vanes com...

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Hauptverfasser:	KATJA CORNELIA JOANNA CLASINA MOORS, JAN STEVEN CHRISTIAAN WESTERLAKEN, MAURICE WILHELMUS LEONARDUS HENDRICUS FEIJTS, PIETER GERARDUS MATHIJS HOEIJMAKERS, SANDER CATHARINA REINIER DERKS, VIOLETA NAVARRO PEREDES, DANIEL JOZEF MARIA DIRECKS, WILLIAM PETER VAN DRENT
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A contamination trap for use in a debris mitigation system of a radiation source, the contamination trap comprising a plurality of vanes configured to trap fuel debris emitted from a plasma formation region of the radiation source; wherein at least one vane or each vane of the plurality of vanes comprises a material comprising a thermal conductivity above 30 W m'1 K'l.