Pellicle and Pellicle Assembly
The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle a...
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| creator | JOHAN HENDRIK KLOOTWIJK PIETER-JAN VAN ZWOL WILLEM JOAN VAN DER ZANDE PETER SIMON ANTONIUS KNAPEN DAVID FERDINAND VLES CHAITANYA KRISHNA ANDE ADRIANUS JOHANNES MARIA GIESBERS HENDRIKUS JAN WONDERGEM PAUL JANSSEN HRISHIKESH PATEL ARNOUD WILLEM NOTENBOOM WILHELMUS THEODORUS ANTHONIUS JOHANNES VAN DEN EINDEN WOUTER ROGIER MEIJERINK JOHANNES PETRUS MARTINUS BERNARDUS VERMEULEN MAXIM ALEKSANDROVICH NASALEVICH JOHANNES JOSEPH JANSSEN MÁRIA PÉTER ALEXANDAR NIKOLOV ZDRAVKOV MARCEL PETER MEIJER WILLEM-PIETER VOORTHUIJZEN RAYMOND OLSMAN GERRIT VAN DEN BOSCH ANTONIUS FRANCISCUS JOHANNES DE GROOT EVGENIA KURGANOVA |
| description | The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device. |
| format | Patent |
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The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200507&DB=EPODOC&CC=NL&NR=2024717A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,309,782,887,25571,76555</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200507&DB=EPODOC&CC=NL&NR=2024717A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>JOHAN HENDRIK KLOOTWIJK</creatorcontrib><creatorcontrib>PIETER-JAN VAN ZWOL</creatorcontrib><creatorcontrib>WILLEM JOAN VAN DER ZANDE</creatorcontrib><creatorcontrib>PETER SIMON ANTONIUS KNAPEN</creatorcontrib><creatorcontrib>DAVID FERDINAND VLES</creatorcontrib><creatorcontrib>CHAITANYA KRISHNA ANDE</creatorcontrib><creatorcontrib>ADRIANUS JOHANNES MARIA GIESBERS</creatorcontrib><creatorcontrib>HENDRIKUS JAN WONDERGEM</creatorcontrib><creatorcontrib>PAUL JANSSEN</creatorcontrib><creatorcontrib>HRISHIKESH PATEL</creatorcontrib><creatorcontrib>ARNOUD WILLEM NOTENBOOM</creatorcontrib><creatorcontrib>WILHELMUS THEODORUS ANTHONIUS JOHANNES VAN DEN EINDEN</creatorcontrib><creatorcontrib>WOUTER ROGIER MEIJERINK</creatorcontrib><creatorcontrib>JOHANNES PETRUS MARTINUS BERNARDUS VERMEULEN</creatorcontrib><creatorcontrib>MAXIM ALEKSANDROVICH NASALEVICH</creatorcontrib><creatorcontrib>JOHANNES JOSEPH JANSSEN</creatorcontrib><creatorcontrib>MÁRIA PÉTER</creatorcontrib><creatorcontrib>ALEXANDAR NIKOLOV ZDRAVKOV</creatorcontrib><creatorcontrib>MARCEL PETER MEIJER</creatorcontrib><creatorcontrib>WILLEM-PIETER VOORTHUIJZEN</creatorcontrib><creatorcontrib>RAYMOND OLSMAN</creatorcontrib><creatorcontrib>GERRIT VAN DEN BOSCH</creatorcontrib><creatorcontrib>ANTONIUS FRANCISCUS JOHANNES DE GROOT</creatorcontrib><creatorcontrib>EVGENIA KURGANOVA</creatorcontrib><title>Pellicle and Pellicle Assembly</title><description>The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. 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The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Pellicle and Pellicle Assembly |
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