Pellicle and Pellicle Assembly

The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle a...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	JOHAN HENDRIK KLOOTWIJK, PIETER-JAN VAN ZWOL, WILLEM JOAN VAN DER ZANDE, PETER SIMON ANTONIUS KNAPEN, DAVID FERDINAND VLES, CHAITANYA KRISHNA ANDE, ADRIANUS JOHANNES MARIA GIESBERS, HENDRIKUS JAN WONDERGEM, PAUL JANSSEN, HRISHIKESH PATEL, ARNOUD WILLEM NOTENBOOM, WILHELMUS THEODORUS ANTHONIUS JOHANNES VAN DEN EINDEN, WOUTER ROGIER MEIJERINK, JOHANNES PETRUS MARTINUS BERNARDUS VERMEULEN, MAXIM ALEKSANDROVICH NASALEVICH, JOHANNES JOSEPH JANSSEN, MÁRIA PÉTER, ALEXANDAR NIKOLOV ZDRAVKOV, MARCEL PETER MEIJER, WILLEM-PIETER VOORTHUIJZEN, RAYMOND OLSMAN, GERRIT VAN DEN BOSCH, ANTONIUS FRANCISCUS JOHANNES DE GROOT, EVGENIA KURGANOVA
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.