Substrate Holder for use in a Lithographic Apparatus and a Device Manufacturing Method

Substrate Holder for use in a Lithographic Apparatus and a Device Manufacturing Method

A substrate holder comprising: a main body having a main body surface; a plurality of burls projecting from the main body surface and configured for supporting the 5 substrate; and an edge seal projecting from the main body surface; wherein: the edge seal is spaced apart from the plurality of burls...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: HERMAN MARQUART, JOHANNES JOSEPHUS MAASSEN, ANDRÉ SCHREUDER
Format: Patent
Sprache:eng
Schlagworte:
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Beschreibung
Zusammenfassung:A substrate holder comprising: a main body having a main body surface; a plurality of burls projecting from the main body surface and configured for supporting the 5 substrate; and an edge seal projecting from the main body surface; wherein: the edge seal is spaced apart from the plurality of burls so as to define a gap therebetween, the gap haVing a width greater than or equal to about 75% of a pitch of the plurality of burls; the plurality of burls comprises a first group of burls and a second group of burls 10 surrounding the first group of burls; and wherein the stiffness in the direction perpendicular to the support plane per unit area of the second group of burls is greater than or equal to about 150% of the stiffness in the direction perpendicular to the support plane per unit area of the first group of burls. 15 FIG. 4