MULTIPLE-PAD RETICLE BUMPERS TO DISTRIBUTE IMPACT LOAD

A bumper apparatus for a reticle includes a first arm and a second arm. The first arm is configured to contact the reticle along a first direction. The second arm is configured to contact the reticle along a second direction. The first arm includes a first bumper disposed toward a 5 distal end of th...

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Hauptverfasser:	ERIC JUSTIN MONKMAN, JOHN ROBERT BURROUGHS
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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creator	ERIC JUSTIN MONKMAN JOHN ROBERT BURROUGHS
description	A bumper apparatus for a reticle includes a first arm and a second arm. The first arm is configured to contact the reticle along a first direction. The second arm is configured to contact the reticle along a second direction. The first arm includes a first bumper disposed toward a 5 distal end of the first arm and a second bumper adjacent the first bumper and disposed toward a proximal end of the first arm. The first bumper includes a first stiffness linkage and the second bumper includes a second stiffness linkage. The first and second bumpers are configured to uniformly distribute an impact force of the reticle.
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The first arm is configured to contact the reticle along a first direction. The second arm is configured to contact the reticle along a second direction. The first arm includes a first bumper disposed toward a 5 distal end of the first arm and a second bumper adjacent the first bumper and disposed toward a proximal end of the first arm. The first bumper includes a first stiffness linkage and the second bumper includes a second stiffness linkage. The first and second bumpers are configured to uniformly distribute an impact force of the reticle.</abstract><oa>free_for_read</oa></addata></record>
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subjects	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
title	MULTIPLE-PAD RETICLE BUMPERS TO DISTRIBUTE IMPACT LOAD
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