MULTIPLE-PAD RETICLE BUMPERS TO DISTRIBUTE IMPACT LOAD

A bumper apparatus for a reticle includes a first arm and a second arm. The first arm is configured to contact the reticle along a first direction. The second arm is configured to contact the reticle along a second direction. The first arm includes a first bumper disposed toward a 5 distal end of th...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	ERIC JUSTIN MONKMAN, JOHN ROBERT BURROUGHS
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	A bumper apparatus for a reticle includes a first arm and a second arm. The first arm is configured to contact the reticle along a first direction. The second arm is configured to contact the reticle along a second direction. The first arm includes a first bumper disposed toward a 5 distal end of the first arm and a second bumper adjacent the first bumper and disposed toward a proximal end of the first arm. The first bumper includes a first stiffness linkage and the second bumper includes a second stiffness linkage. The first and second bumpers are configured to uniformly distribute an impact force of the reticle.