LASER SYSTEM FOR TARGET METROLOGY AND ALTERATION IN AN EUV LIGHT SOURCE

LASER SYSTEM FOR TARGET METROLOGY AND ALTERATION IN AN EUV LIGHT SOURCE

Disclosed is a system and method for generating EUV radiation in which a laser is used in a multistage process to illuminate without altering a target material and then irradiate the target material to alter a target material with the illumination stage being used to determine the 5 timing for firing...

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Hauptverfasser: IGOR VLADIMIROVICH FOMENKOV, ROBERT JAY RAFAC
Format: Patent
Sprache:eng
Schlagworte:
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CINEMATOGRAPHY
ELECTROGRAPHY
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ORIGINALS THEREFOR
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Beschreibung
Zusammenfassung:Disclosed is a system and method for generating EUV radiation in which a laser is used in a multistage process to illuminate without altering a target material and then irradiate the target material to alter a target material with the illumination stage being used to determine the 5 timing for firing during the irradiation stage or stages.