A DEVICE, APPARATUS, LITHOGRAPHIC DEVICE AND METHOD

The present invention provides a device for providing substantially laminar fluid flow in a lithographic apparatus. The device comprises an opening and a channel through Which fluid flows to or from the opening, the channel defined Within an enclosure formed by at least a first wall and a second wal...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	JOHANNES MAESSEN, PEPIJN VAN DEN EIJNDEN, ROBIN BERNARDUS JOHANNES KOLDEWEIJ, CORNELIUS MARIA ROPS, ERIK HENRICUS EGIDIUS CATHARINA EUMMELEN, PETRUS MARTINUS GERARDUS JOHANNES ARTS, NUPUR SUBHEDAR
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The present invention provides a device for providing substantially laminar fluid flow in a lithographic apparatus. The device comprises an opening and a channel through Which fluid flows to or from the opening, the channel defined Within an enclosure formed by at least a first wall and a second wall. The device also comprises a flow laminating portion in the channel configured to provide the substantially laminar fluid flow through the opening. The flow laminating portion may comprise a plurality of pillars, and/or a plurality of sub-channels, and/or a porous layer across the channel.