CLEANING DEVICE AND METHOD OF CLEANING

A cleaning device for an apparatus for processing production substrates, the cleaning device comprising: a body having dimensions similar to the production substrates so that the cleaning device is compatible With the apparatus, the body having a first major surface and a second major surface facing...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	GHEORGHE TANASA, MIAO YU, THEODORUS WILHELMUS POLET, FERDY MIGCHELBRINK, ERIK HENRICUS EGIDIUS CATHARINA EUMMELEN, PETRUS MARTINUS GERARDUS JOHANNES ARTS, GIOVANNI LUCA GATTOBIGIO, HAN HENRICUS ALDEGONDA LEMPENS, MAARTEN HOLTRUST
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A cleaning device for an apparatus for processing production substrates, the cleaning device comprising: a body having dimensions similar to the production substrates so that the cleaning device is compatible With the apparatus, the body having a first major surface and a second major surface facing in the opposite direction to the first major surface; a chamber Within the body configured to accommodate contaminants; an inlet from the first major surface to the chamber and configured to allow contaminants to be drawn into the chamber by a flow of fluid; and an outlet from the chamber to the second major surface, the cleaning device being configured to allow the fluid to exit the chamber but to prevent a contaminant leaving the chamber.