LITHOGRAPHIC APPARATUS WITH IMPROVED PATTERNING PERFORMANCE

A lithographic apparatus comprising: a movable stage comprising a support structure configured to support a patterning device; a plate positioned between the movable stage and a projection system; wherein the plate comprises: a first surface that faces the movable stage; a second surface that faces...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	JOSÉ NILTON FONSECA, GERBEN PIETERSE, FEDERICO LA TORRE, FRANK JOHANNES JACOBUS VAN BOXTEL, LAURENTIUS JOHANNES ADRIANUS VAN BOKHOVEN, ERIK HENRICUS EGIDIUS CATHARINA EUMMELEN
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A lithographic apparatus comprising: a movable stage comprising a support structure configured to support a patterning device; a plate positioned between the movable stage and a projection system; wherein the plate comprises: a first surface that faces the movable stage; a second surface that faces the projection system; an opening through the plate such that the patterned radiation beam passes through the opening, wherein the opening has at least a first side and a second side that extend from the first surface to the second surface; one or more gas outlets in the first side of the opening and one or more gas outlets in the first surface of the plate, wherein the gas outlets are configured such that gas is supplied, via the gas outlets, to a region between the movable stage and the projection system; one or more gas inlets in the second side of the opening.