Apparatus and methods for cleaning
A method of cleaning a surface to remove a contaminant therefrom, the method comprising the steps of oxidizing at least a portion of the contaminant and passing a stream of carbon dioxide snow over the contaminant. An apparatus for cleaning a surface, the apparatus comprising at least one carbon dio...
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creator | MARCUS ADRIANUS VAN DE KERKHOF KIRILL BYSTROV ALEXEY SERGEEVICH KUZNETSOV ANDREY NIKIPELOV VADIM YEVGENYEVICH BANINE NADJA SCHUH |
description | A method of cleaning a surface to remove a contaminant therefrom, the method comprising the steps of oxidizing at least a portion of the contaminant and passing a stream of carbon dioxide snow over the contaminant. An apparatus for cleaning a surface, the apparatus comprising at least one carbon dioxide snow outlet, and at least one plasma outlet, and a cleaning head comprising at least one carbon dioxide snow outlet and at least one plasma outlet are also disclosed. |
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fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_NL2021819A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>NL2021819A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_NL2021819A3</originalsourceid><addsrcrecordid>eNrjZFByLChILEosKS1WSMxLUchNLcnITylWSMsvUkjOSU3My8xL52FgTUvMKU7lhdLcDPJuriHOHrqpBfnxqcUFicmpeakl8X4-RgZGhhaGlo7GhFUAABblJSU</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Apparatus and methods for cleaning</title><source>esp@cenet</source><creator>MARCUS ADRIANUS VAN DE KERKHOF ; KIRILL BYSTROV ; ALEXEY SERGEEVICH KUZNETSOV ; ANDREY NIKIPELOV ; VADIM YEVGENYEVICH BANINE ; NADJA SCHUH</creator><creatorcontrib>MARCUS ADRIANUS VAN DE KERKHOF ; KIRILL BYSTROV ; ALEXEY SERGEEVICH KUZNETSOV ; ANDREY NIKIPELOV ; VADIM YEVGENYEVICH BANINE ; NADJA SCHUH</creatorcontrib><description>A method of cleaning a surface to remove a contaminant therefrom, the method comprising the steps of oxidizing at least a portion of the contaminant and passing a stream of carbon dioxide snow over the contaminant. An apparatus for cleaning a surface, the apparatus comprising at least one carbon dioxide snow outlet, and at least one plasma outlet, and a cleaning head comprising at least one carbon dioxide snow outlet and at least one plasma outlet are also disclosed.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2019</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190513&DB=EPODOC&CC=NL&NR=2021819A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190513&DB=EPODOC&CC=NL&NR=2021819A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MARCUS ADRIANUS VAN DE KERKHOF</creatorcontrib><creatorcontrib>KIRILL BYSTROV</creatorcontrib><creatorcontrib>ALEXEY SERGEEVICH KUZNETSOV</creatorcontrib><creatorcontrib>ANDREY NIKIPELOV</creatorcontrib><creatorcontrib>VADIM YEVGENYEVICH BANINE</creatorcontrib><creatorcontrib>NADJA SCHUH</creatorcontrib><title>Apparatus and methods for cleaning</title><description>A method of cleaning a surface to remove a contaminant therefrom, the method comprising the steps of oxidizing at least a portion of the contaminant and passing a stream of carbon dioxide snow over the contaminant. An apparatus for cleaning a surface, the apparatus comprising at least one carbon dioxide snow outlet, and at least one plasma outlet, and a cleaning head comprising at least one carbon dioxide snow outlet and at least one plasma outlet are also disclosed.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2019</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFByLChILEosKS1WSMxLUchNLcnITylWSMsvUkjOSU3My8xL52FgTUvMKU7lhdLcDPJuriHOHrqpBfnxqcUFicmpeakl8X4-RgZGhhaGlo7GhFUAABblJSU</recordid><startdate>20190513</startdate><enddate>20190513</enddate><creator>MARCUS ADRIANUS VAN DE KERKHOF</creator><creator>KIRILL BYSTROV</creator><creator>ALEXEY SERGEEVICH KUZNETSOV</creator><creator>ANDREY NIKIPELOV</creator><creator>VADIM YEVGENYEVICH BANINE</creator><creator>NADJA SCHUH</creator><scope>EVB</scope></search><sort><creationdate>20190513</creationdate><title>Apparatus and methods for cleaning</title><author>MARCUS ADRIANUS VAN DE KERKHOF ; KIRILL BYSTROV ; ALEXEY SERGEEVICH KUZNETSOV ; ANDREY NIKIPELOV ; VADIM YEVGENYEVICH BANINE ; NADJA SCHUH</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_NL2021819A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2019</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>MARCUS ADRIANUS VAN DE KERKHOF</creatorcontrib><creatorcontrib>KIRILL BYSTROV</creatorcontrib><creatorcontrib>ALEXEY SERGEEVICH KUZNETSOV</creatorcontrib><creatorcontrib>ANDREY NIKIPELOV</creatorcontrib><creatorcontrib>VADIM YEVGENYEVICH BANINE</creatorcontrib><creatorcontrib>NADJA SCHUH</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MARCUS ADRIANUS VAN DE KERKHOF</au><au>KIRILL BYSTROV</au><au>ALEXEY SERGEEVICH KUZNETSOV</au><au>ANDREY NIKIPELOV</au><au>VADIM YEVGENYEVICH BANINE</au><au>NADJA SCHUH</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Apparatus and methods for cleaning</title><date>2019-05-13</date><risdate>2019</risdate><abstract>A method of cleaning a surface to remove a contaminant therefrom, the method comprising the steps of oxidizing at least a portion of the contaminant and passing a stream of carbon dioxide snow over the contaminant. An apparatus for cleaning a surface, the apparatus comprising at least one carbon dioxide snow outlet, and at least one plasma outlet, and a cleaning head comprising at least one carbon dioxide snow outlet and at least one plasma outlet are also disclosed.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
title | Apparatus and methods for cleaning |
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