Apparatus and methods for cleaning

A method of cleaning a surface to remove a contaminant therefrom, the method comprising the steps of oxidizing at least a portion of the contaminant and passing a stream of carbon dioxide snow over the contaminant. An apparatus for cleaning a surface, the apparatus comprising at least one carbon dio...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: MARCUS ADRIANUS VAN DE KERKHOF, KIRILL BYSTROV, ALEXEY SERGEEVICH KUZNETSOV, ANDREY NIKIPELOV, VADIM YEVGENYEVICH BANINE, NADJA SCHUH
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator MARCUS ADRIANUS VAN DE KERKHOF
KIRILL BYSTROV
ALEXEY SERGEEVICH KUZNETSOV
ANDREY NIKIPELOV
VADIM YEVGENYEVICH BANINE
NADJA SCHUH
description A method of cleaning a surface to remove a contaminant therefrom, the method comprising the steps of oxidizing at least a portion of the contaminant and passing a stream of carbon dioxide snow over the contaminant. An apparatus for cleaning a surface, the apparatus comprising at least one carbon dioxide snow outlet, and at least one plasma outlet, and a cleaning head comprising at least one carbon dioxide snow outlet and at least one plasma outlet are also disclosed.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_NL2021819A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>NL2021819A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_NL2021819A3</originalsourceid><addsrcrecordid>eNrjZFByLChILEosKS1WSMxLUchNLcnITylWSMsvUkjOSU3My8xL52FgTUvMKU7lhdLcDPJuriHOHrqpBfnxqcUFicmpeakl8X4-RgZGhhaGlo7GhFUAABblJSU</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Apparatus and methods for cleaning</title><source>esp@cenet</source><creator>MARCUS ADRIANUS VAN DE KERKHOF ; KIRILL BYSTROV ; ALEXEY SERGEEVICH KUZNETSOV ; ANDREY NIKIPELOV ; VADIM YEVGENYEVICH BANINE ; NADJA SCHUH</creator><creatorcontrib>MARCUS ADRIANUS VAN DE KERKHOF ; KIRILL BYSTROV ; ALEXEY SERGEEVICH KUZNETSOV ; ANDREY NIKIPELOV ; VADIM YEVGENYEVICH BANINE ; NADJA SCHUH</creatorcontrib><description>A method of cleaning a surface to remove a contaminant therefrom, the method comprising the steps of oxidizing at least a portion of the contaminant and passing a stream of carbon dioxide snow over the contaminant. An apparatus for cleaning a surface, the apparatus comprising at least one carbon dioxide snow outlet, and at least one plasma outlet, and a cleaning head comprising at least one carbon dioxide snow outlet and at least one plasma outlet are also disclosed.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2019</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20190513&amp;DB=EPODOC&amp;CC=NL&amp;NR=2021819A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20190513&amp;DB=EPODOC&amp;CC=NL&amp;NR=2021819A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MARCUS ADRIANUS VAN DE KERKHOF</creatorcontrib><creatorcontrib>KIRILL BYSTROV</creatorcontrib><creatorcontrib>ALEXEY SERGEEVICH KUZNETSOV</creatorcontrib><creatorcontrib>ANDREY NIKIPELOV</creatorcontrib><creatorcontrib>VADIM YEVGENYEVICH BANINE</creatorcontrib><creatorcontrib>NADJA SCHUH</creatorcontrib><title>Apparatus and methods for cleaning</title><description>A method of cleaning a surface to remove a contaminant therefrom, the method comprising the steps of oxidizing at least a portion of the contaminant and passing a stream of carbon dioxide snow over the contaminant. An apparatus for cleaning a surface, the apparatus comprising at least one carbon dioxide snow outlet, and at least one plasma outlet, and a cleaning head comprising at least one carbon dioxide snow outlet and at least one plasma outlet are also disclosed.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2019</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFByLChILEosKS1WSMxLUchNLcnITylWSMsvUkjOSU3My8xL52FgTUvMKU7lhdLcDPJuriHOHrqpBfnxqcUFicmpeakl8X4-RgZGhhaGlo7GhFUAABblJSU</recordid><startdate>20190513</startdate><enddate>20190513</enddate><creator>MARCUS ADRIANUS VAN DE KERKHOF</creator><creator>KIRILL BYSTROV</creator><creator>ALEXEY SERGEEVICH KUZNETSOV</creator><creator>ANDREY NIKIPELOV</creator><creator>VADIM YEVGENYEVICH BANINE</creator><creator>NADJA SCHUH</creator><scope>EVB</scope></search><sort><creationdate>20190513</creationdate><title>Apparatus and methods for cleaning</title><author>MARCUS ADRIANUS VAN DE KERKHOF ; KIRILL BYSTROV ; ALEXEY SERGEEVICH KUZNETSOV ; ANDREY NIKIPELOV ; VADIM YEVGENYEVICH BANINE ; NADJA SCHUH</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_NL2021819A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2019</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>MARCUS ADRIANUS VAN DE KERKHOF</creatorcontrib><creatorcontrib>KIRILL BYSTROV</creatorcontrib><creatorcontrib>ALEXEY SERGEEVICH KUZNETSOV</creatorcontrib><creatorcontrib>ANDREY NIKIPELOV</creatorcontrib><creatorcontrib>VADIM YEVGENYEVICH BANINE</creatorcontrib><creatorcontrib>NADJA SCHUH</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MARCUS ADRIANUS VAN DE KERKHOF</au><au>KIRILL BYSTROV</au><au>ALEXEY SERGEEVICH KUZNETSOV</au><au>ANDREY NIKIPELOV</au><au>VADIM YEVGENYEVICH BANINE</au><au>NADJA SCHUH</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Apparatus and methods for cleaning</title><date>2019-05-13</date><risdate>2019</risdate><abstract>A method of cleaning a surface to remove a contaminant therefrom, the method comprising the steps of oxidizing at least a portion of the contaminant and passing a stream of carbon dioxide snow over the contaminant. An apparatus for cleaning a surface, the apparatus comprising at least one carbon dioxide snow outlet, and at least one plasma outlet, and a cleaning head comprising at least one carbon dioxide snow outlet and at least one plasma outlet are also disclosed.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_epo_espacenet_NL2021819A
source esp@cenet
subjects APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
title Apparatus and methods for cleaning
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-19T07%3A59%3A53IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=MARCUS%20ADRIANUS%20VAN%20DE%20KERKHOF&rft.date=2019-05-13&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ENL2021819A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true