Apparatus and methods for cleaning

A method of cleaning a surface to remove a contaminant therefrom, the method comprising the steps of oxidizing at least a portion of the contaminant and passing a stream of carbon dioxide snow over the contaminant. An apparatus for cleaning a surface, the apparatus comprising at least one carbon dio...

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Bibliographische Detailangaben
Hauptverfasser:	MARCUS ADRIANUS VAN DE KERKHOF, KIRILL BYSTROV, ALEXEY SERGEEVICH KUZNETSOV, ANDREY NIKIPELOV, VADIM YEVGENYEVICH BANINE, NADJA SCHUH
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A method of cleaning a surface to remove a contaminant therefrom, the method comprising the steps of oxidizing at least a portion of the contaminant and passing a stream of carbon dioxide snow over the contaminant. An apparatus for cleaning a surface, the apparatus comprising at least one carbon dioxide snow outlet, and at least one plasma outlet, and a cleaning head comprising at least one carbon dioxide snow outlet and at least one plasma outlet are also disclosed.