OPTICAL SYSTEM, METROLOGY APPARATUS AND ASSOCIATED METHOD

There is described an optical system ( 400) for focusing a beam of radiation (B) on a region of interest of a substrate in a metrology apparatus. The beam of radiation comprises radiation in a soft X-ray or Extreme Ultraviolet spectral range. The optical system comprises a first reflector system ( 4...

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1. Verfasser:	PETER DANNY VAN VOORST
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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creator	PETER DANNY VAN VOORST
description	There is described an optical system ( 400) for focusing a beam of radiation (B) on a region of interest of a substrate in a metrology apparatus. The beam of radiation comprises radiation in a soft X-ray or Extreme Ultraviolet spectral range. The optical system comprises a first reflector system ( 41 0) and a second reflector system (412). Each ofthe first and second reflector systems (410, 412) comprises a finite-to-finite W olter reflector system. The optical system ( 400) is configured to form, on the region of interest, a demagnified image ( 414) of an object ( 416) comprising an apparent source of the beam of radiation (B).
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subjects	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
title	OPTICAL SYSTEM, METROLOGY APPARATUS AND ASSOCIATED METHOD
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