OPTICAL SYSTEM, METROLOGY APPARATUS AND ASSOCIATED METHOD

There is described an optical system ( 400) for focusing a beam of radiation (B) on a region of interest of a substrate in a metrology apparatus. The beam of radiation comprises radiation in a soft X-ray or Extreme Ultraviolet spectral range. The optical system comprises a first reflector system ( 4...

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Bibliographische Detailangaben
1. Verfasser:	PETER DANNY VAN VOORST
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	There is described an optical system ( 400) for focusing a beam of radiation (B) on a region of interest of a substrate in a metrology apparatus. The beam of radiation comprises radiation in a soft X-ray or Extreme Ultraviolet spectral range. The optical system comprises a first reflector system ( 41 0) and a second reflector system (412). Each ofthe first and second reflector systems (410, 412) comprises a finite-to-finite W olter reflector system. The optical system ( 400) is configured to form, on the region of interest, a demagnified image ( 414) of an object ( 416) comprising an apparent source of the beam of radiation (B).