A method of manufacturing a passivated solar cell and resulting passivated solar cell

Method of manufacturing a passivated solar cell, comprising the steps of: providing a semiconductor substrate with a first side and an opposed second side; applying a tunnel dielectric and a polysilicon layer on the second side; applying a dopant to the polysilicon layer on the second side; applying...

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Hauptverfasser: RONALD CORNELIS GERARD NABER, MARTIJN LENES, JOHANNES REINDER MARC LUCHIES
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creator RONALD CORNELIS GERARD NABER
MARTIJN LENES
JOHANNES REINDER MARC LUCHIES
description Method of manufacturing a passivated solar cell, comprising the steps of: providing a semiconductor substrate with a first side and an opposed second side; applying a tunnel dielectric and a polysilicon layer on the second side; applying a dopant to the polysilicon layer on the second side; applying a tunnel dielectric and a polysilicon layer on the first side, and diffusing a dopant into the polysilicon layer by means of an anneal; providing an anti-reflection coating on the first side, wherein an etch stop interface is created within the polysilicon layer on the first side the tunnel dielectrics and the polysilicon layers on the first and the second side are formed simultaneously, and the polysilicon layer on the first side is thinned down to the etch stop interface.
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title A method of manufacturing a passivated solar cell and resulting passivated solar cell
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