A method of manufacturing a passivated solar cell and resulting passivated solar cell

Method of manufacturing a passivated solar cell, comprising the steps of: providing a semiconductor substrate with a first side and an opposed second side; applying a tunnel dielectric and a polysilicon layer on the second side; applying a dopant to the polysilicon layer on the second side; applying...

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Bibliographische Detailangaben
Hauptverfasser:	RONALD CORNELIS GERARD NABER, MARTIJN LENES, JOHANNES REINDER MARC LUCHIES
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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Beschreibung
Zusammenfassung:	Method of manufacturing a passivated solar cell, comprising the steps of: providing a semiconductor substrate with a first side and an opposed second side; applying a tunnel dielectric and a polysilicon layer on the second side; applying a dopant to the polysilicon layer on the second side; applying a tunnel dielectric and a polysilicon layer on the first side, and diffusing a dopant into the polysilicon layer by means of an anneal; providing an anti-reflection coating on the first side, wherein an etch stop interface is created within the polysilicon layer on the first side the tunnel dielectrics and the polysilicon layers on the first and the second side are formed simultaneously, and the polysilicon layer on the first side is thinned down to the etch stop interface.