Substrate exposure system and a frame therefore

The invention relates to a substrate exposure system comprising a frame, a substrate support module for carrying a substrate, and an exposure apparatus for exposing the substrate carried. by the substrate support module. The frame comprises a bottom wall, side walls and an upper wall which are arran...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser: JERRY JOHANNES MARTINUS PEIJSTER
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:The invention relates to a substrate exposure system comprising a frame, a substrate support module for carrying a substrate, and an exposure apparatus for exposing the substrate carried. by the substrate support module. The frame comprises a bottom wall, side walls and an upper wall which are arranged to surround an inner space. The substrate support module is arranged on top of said bottom wall, and the exposure apparatus is connected to a wall or to the upper' wall. The substrate exposure system comprises a housing which encloses said frame, exposure apparatus and substrate support module. said housing is configured for providing a vacuum inside said housing. At least one of the side walls and upper wall of said frame comprises an array of through openings for providing a flow path for a fluid from the inner space to a space between the housing and said frame.