System and method for measurement of alignment

A system comprises a topography measurement system configured to determine a respective height for each of a plurality of locations on a substrate; and a processor configured to: determine a height map for the substrate based on the determined heights for the plurality of locations; and determine at...

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Bibliographische Detailangaben
Hauptverfasser:	WIM TJIBBO TEL, EMIL PETER SCHMITT-WEAVER, THEODORUS FRANCISCUS ADRIANUS MARIA LINSCHOTEN, KAUSTUVE BHATTACHARYYA, WOLFGANG HELMUT HENKE, RENE MARINUS GERARDUS JOHAN QUEENS
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A system comprises a topography measurement system configured to determine a respective height for each of a plurality of locations on a substrate; and a processor configured to: determine a height map for the substrate based on the determined heights for the plurality of locations; and determine at least one alignment parameter for the substrate by comparing the height map and a reference height map, 5 wherein the reference height map comprises or represents heights for a plurality of locations on a reference substrate portion. (Fig. 3)