A LITHOGRAPHY APPARATUS AND A METHOD OF MANUFACTURING A DEVICE

A device manufacturing method comprising: confining a liquid to an immersion space between a projection system and a facing surface of an object on a support table and/or the support table using a liquid confinement structure; starting application of an underpressure to an extraction unit to remove fluid from a position proximate an edge of the object before the immersion space moves onto the object; moving the support table along a route comprising a series of motions such that a plurality of target positions on the object pass under the projection system; projecting through the immersion space a patterned beam onto the target portions of the object as the target portions pass under the projection system, wherein the projecting is performed to account for a certain predetermined thermal profile in the object; stopping application of the underpressure at a predetermined time after the immersion space moves off the object for the last time during the series of motions, thereby at least partly to induce the certain predetermined thermal profile in the object.