A LITHOGRAPHY APPARATUS AND A METHOD OF MANUFACTURING A DEVICE

An immersion lithography apparatus comprising: a support table; a projection system; a positioner; a liquid confinement structure; and a controller configured to control the positioner to move the support table to follow a route comprised of a series of motions and to control the liquid confinement...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	JOHN MARIA BOMBEECK, KOEN CUYPERS, THEODORUS WILHELMUS POLET, FRANK DEBOUGNOUX, JORGE ALBERTO VIEYRA SALAS, JOHANNES CORNELIS PAULUS MELMAN, ERIK HENRICUS EGIDIUS CATHARINA EUMMELEN, GIOVANNI LUCA GATTOBIGIO, HAN HENRICUS ALDEGONDA LEMPENS
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	An immersion lithography apparatus comprising: a support table; a projection system; a positioner; a liquid confinement structure; and a controller configured to control the positioner to move the support table to follow a route comprised of a series of motions and to control the liquid confinement structure, the controller adapted to: predict whether the liquid will be lost from an immersion space during at least one motion of the series of motions in which an edge of the immersion space passes over an edge of an object supported by the support table, and if predicted, to modify fluid flow such that a first fluid flow rate at the leading edge of the liquid confinement structure is different to a second fluid flow rate at the trailing edge of the liquid confinement structure during the motion of predicted liquid loss or subsequent to the motion of predicted liquid loss.