Dopant enhanced solar cell and method of manufacturing thereof
The present invention relates to a dopant enhanced solar cell based on a silicon substrate and method of manufacturing thereof. The solar cell includes on a surface of the substrate a layer stack including a thin oxide layer and a polysilicon layer, the 5 thin oxide layer being arranged as a tunnel...
Gespeichert in:
Hauptverfasser: | , , , , |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | The present invention relates to a dopant enhanced solar cell based on a silicon substrate and method of manufacturing thereof. The solar cell includes on a surface of the substrate a layer stack including a thin oxide layer and a polysilicon layer, the 5 thin oxide layer being arranged as a tunnel oxide layer in-between the surface of the substrate and the polysilicon layer. The solar cell is provided with fire-through metal contacts arranged on the layer stack locally penetrating into the polysilicon layer. The silicon substrate is provided at the side of the surface with a dopant species that creates a dopant profile of a first conductivity type in the silicon substrate. The dopant lO profile in the silicon substrate has a maXimal dopant level between about 1>< 10+18 and about 3> |
---|