A LITHOGRAPHY APPARATUS AND A METHOD OF MANUFACTURING A DEVICE

An immersion lithography apparatus comprising: a support table configured to support an object having at least one target portion; a projection system configured to project a patterned beam onto the object; a positioner configured to move the support table relative to the projection system; a liquid confinement structure configured to confine a liquid to an immersion space between the projection system and a surface of the object and/or the support table; and a controller configured to control the positioner to move the support table to follow a route comprised of a series of motions, the controller adapted to: predict a speed of an edge of the immersion space relative to an edge of the object when the edge of the immersion space passes over the edge of the object during at least one motion of the series of motions of the route; compare the speed to a predetermined parameter and to predict liquid loss from the immersion space during the at least one motion if the speed is greater than the predetermined parameter; and if liquid loss from the immersion space is predicted, to modify one or more parameters of the route during the at least one motion accordingly.