FLUID HANDLING STRUCTURE FOR LITHOGRAPHIC APPARATUS

A fluid handling structure configured to confine immersion fluid to a region of a lithographic apparatus, comprising: an aperture formed therein; a first part; and a second part. At least one of the first part and the second part defines a surface adapted for the extraction of the immersion fluid fr...

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Hauptverfasser:	MARK JOHANNES HERMANUS FRENCKEN, THEODORUS WILHELMUS POLET, ROGIER HENDRIKUS MAGDALENA CORTIE, HAROLD SEBASTIAAN BUDDENBERG, EVERT VAN VLIET, GIOVANNI LUCA GATTOBIGIO, JANTIEN LAURA VAN ERVE, NICOLAAS TEN KATE, GHEORGHE TANASA, KOEN CUYPERS, PEPIJN VAN DEN EIJNDEN, FLOOR LODEWIJK KEUKENS, CORNELIUS MARIA ROPS, MARRCEL MARIA CORNELIUS FRANCISCUS TEUNISSEN
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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