FLUID HANDLING STRUCTURE FOR LITHOGRAPHIC APPARATUS

A fluid handling structure configured to confine immersion fluid to a region of a lithographic apparatus, comprising: an aperture formed therein; a first part; and a second part. At least one of the first part and the second part defines a surface adapted for the extraction of the immersion fluid fr...

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Bibliographische Detailangaben
Hauptverfasser:	MARK JOHANNES HERMANUS FRENCKEN, THEODORUS WILHELMUS POLET, ROGIER HENDRIKUS MAGDALENA CORTIE, HAROLD SEBASTIAAN BUDDENBERG, EVERT VAN VLIET, GIOVANNI LUCA GATTOBIGIO, JANTIEN LAURA VAN ERVE, NICOLAAS TEN KATE, GHEORGHE TANASA, KOEN CUYPERS, PEPIJN VAN DEN EIJNDEN, FLOOR LODEWIJK KEUKENS, CORNELIUS MARIA ROPS, MARRCEL MARIA CORNELIUS FRANCISCUS TEUNISSEN
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A fluid handling structure configured to confine immersion fluid to a region of a lithographic apparatus, comprising: an aperture formed therein; a first part; and a second part. At least one of the first part and the second part defines a surface adapted for the extraction of the immersion fluid from the region. The fluid handling structure is adapted to provide a fluid flow into or out of the surface thereof and movement of the first part relative to the second part is effective to change a position of the fluid flow into or out of the surface relative to the aperture. One of the first part and second part comprises at least one through-hole for the fluid flow there through and the other of the first part and second part comprises at least one opening for the fluid flow there through.