Method and apparatus for exposing a sample
The invention relates to a method and an apparatus for exposing a sample. The apparatus comprises an exposing unit for exposing said sample to electromagnetic radiation or particles having energy, and a substrate holding device for holding said sample at least during said exposing. The exposing unit...
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| creator | JERRY JOHANNES MARTINUS PEIJSTER PAUL IJMERT SCHEFFERS |
| description | The invention relates to a method and an apparatus for exposing a sample. The apparatus comprises an exposing unit for exposing said sample to electromagnetic radiation or particles having energy, and a substrate holding device for holding said sample at least during said exposing. The exposing unit comprises a component for manipulating and/or blocking at least part of the electromagnetic radiation or charged particles. The component comprises a cooling arrangement for substantially maintaining the component at a first temperature. The substrate holding device comprises a temperature stabilizing arrangement which is arranged to substantially stabilize the temperature of a sample arranged on said substrate holding device. The temperature stabilizing arrangement comprises a phase change material having a phase change at a second temperature. The cooling arrangement comprises a control device which is configured to regulate the first temperature to be near or equal to the second temperature. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_NL2019355A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>NL2019355A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_NL2019355A3</originalsourceid><addsrcrecordid>eNrjZNDyTS3JyE9RSMwD4oKCxKLEktJihbT8IoXUioL84sy8dIVEheLE3IKcVB4G1rTEnOJUXijNzSDv5hri7KGbWpAfn1pckJicmpdaEu_nY2RgaGlsaupoTFgFAHymKA0</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Method and apparatus for exposing a sample</title><source>esp@cenet</source><creator>JERRY JOHANNES MARTINUS PEIJSTER ; PAUL IJMERT SCHEFFERS</creator><creatorcontrib>JERRY JOHANNES MARTINUS PEIJSTER ; PAUL IJMERT SCHEFFERS</creatorcontrib><description>The invention relates to a method and an apparatus for exposing a sample. The apparatus comprises an exposing unit for exposing said sample to electromagnetic radiation or particles having energy, and a substrate holding device for holding said sample at least during said exposing. The exposing unit comprises a component for manipulating and/or blocking at least part of the electromagnetic radiation or charged particles. The component comprises a cooling arrangement for substantially maintaining the component at a first temperature. The substrate holding device comprises a temperature stabilizing arrangement which is arranged to substantially stabilize the temperature of a sample arranged on said substrate holding device. The temperature stabilizing arrangement comprises a phase change material having a phase change at a second temperature. The cooling arrangement comprises a control device which is configured to regulate the first temperature to be near or equal to the second temperature.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>2018</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20180131&DB=EPODOC&CC=NL&NR=2019355A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20180131&DB=EPODOC&CC=NL&NR=2019355A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>JERRY JOHANNES MARTINUS PEIJSTER</creatorcontrib><creatorcontrib>PAUL IJMERT SCHEFFERS</creatorcontrib><title>Method and apparatus for exposing a sample</title><description>The invention relates to a method and an apparatus for exposing a sample. The apparatus comprises an exposing unit for exposing said sample to electromagnetic radiation or particles having energy, and a substrate holding device for holding said sample at least during said exposing. The exposing unit comprises a component for manipulating and/or blocking at least part of the electromagnetic radiation or charged particles. The component comprises a cooling arrangement for substantially maintaining the component at a first temperature. The substrate holding device comprises a temperature stabilizing arrangement which is arranged to substantially stabilize the temperature of a sample arranged on said substrate holding device. The temperature stabilizing arrangement comprises a phase change material having a phase change at a second temperature. The cooling arrangement comprises a control device which is configured to regulate the first temperature to be near or equal to the second temperature.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2018</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNDyTS3JyE9RSMwD4oKCxKLEktJihbT8IoXUioL84sy8dIVEheLE3IKcVB4G1rTEnOJUXijNzSDv5hri7KGbWpAfn1pckJicmpdaEu_nY2RgaGlsaupoTFgFAHymKA0</recordid><startdate>20180131</startdate><enddate>20180131</enddate><creator>JERRY JOHANNES MARTINUS PEIJSTER</creator><creator>PAUL IJMERT SCHEFFERS</creator><scope>EVB</scope></search><sort><creationdate>20180131</creationdate><title>Method and apparatus for exposing a sample</title><author>JERRY JOHANNES MARTINUS PEIJSTER ; PAUL IJMERT SCHEFFERS</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_NL2019355A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2018</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>JERRY JOHANNES MARTINUS PEIJSTER</creatorcontrib><creatorcontrib>PAUL IJMERT SCHEFFERS</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>JERRY JOHANNES MARTINUS PEIJSTER</au><au>PAUL IJMERT SCHEFFERS</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Method and apparatus for exposing a sample</title><date>2018-01-31</date><risdate>2018</risdate><abstract>The invention relates to a method and an apparatus for exposing a sample. The apparatus comprises an exposing unit for exposing said sample to electromagnetic radiation or particles having energy, and a substrate holding device for holding said sample at least during said exposing. The exposing unit comprises a component for manipulating and/or blocking at least part of the electromagnetic radiation or charged particles. The component comprises a cooling arrangement for substantially maintaining the component at a first temperature. The substrate holding device comprises a temperature stabilizing arrangement which is arranged to substantially stabilize the temperature of a sample arranged on said substrate holding device. The temperature stabilizing arrangement comprises a phase change material having a phase change at a second temperature. The cooling arrangement comprises a control device which is configured to regulate the first temperature to be near or equal to the second temperature.</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | Method and apparatus for exposing a sample |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-25T13%3A54%3A15IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=JERRY%20JOHANNES%20MARTINUS%20PEIJSTER&rft.date=2018-01-31&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ENL2019355A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |