Method and apparatus for exposing a sample

The invention relates to a method and an apparatus for exposing a sample. The apparatus comprises an exposing unit for exposing said sample to electromagnetic radiation or particles having energy, and a substrate holding device for holding said sample at least during said exposing. The exposing unit...

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Bibliographische Detailangaben
Hauptverfasser:	JERRY JOHANNES MARTINUS PEIJSTER, PAUL IJMERT SCHEFFERS
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	The invention relates to a method and an apparatus for exposing a sample. The apparatus comprises an exposing unit for exposing said sample to electromagnetic radiation or particles having energy, and a substrate holding device for holding said sample at least during said exposing. The exposing unit comprises a component for manipulating and/or blocking at least part of the electromagnetic radiation or charged particles. The component comprises a cooling arrangement for substantially maintaining the component at a first temperature. The substrate holding device comprises a temperature stabilizing arrangement which is arranged to substantially stabilize the temperature of a sample arranged on said substrate holding device. The temperature stabilizing arrangement comprises a phase change material having a phase change at a second temperature. The cooling arrangement comprises a control device which is configured to regulate the first temperature to be near or equal to the second temperature.