POSITIONING SYSTEM, CONTROL SYSTEM, METHOD TO POSITION, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

The invention relates to a positioning system for positioning an object, comprising a base frame, a balance mass, a position actuator, a drift actuator and a control system, wherein the position actuator is arranged to apply a first force between the object and the balance mass to position the objec...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	WILHELMUS HENRICUS THEODORUS MARIA AANGENENT, MAURITIUS GERARDUS ELISABETH SCHNEIDERS
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The invention relates to a positioning system for positioning an object, comprising a base frame, a balance mass, a position actuator, a drift actuator and a control system, wherein the position actuator is arranged to apply a first force between the object and the balance mass to position the object, wherein the drift actuator is arranged to apply a second force between the balance mass and the base frame to position the balance mass relative to the base frame, wherein the control system is configured to control the position actuator based on a sequence of setpoints that is representative for desired positions of the object relative to a reference, wherein the control system is configured to determine a determined trajectory based on the sequence of setpoints before using the sequence of setpoints to control the position actuator, and to control the drift actuator based on the determined trajectory.