A Lithographic System and Method

A system comprises a first radiation source configured to provide a first radiation beam, at least one splitter configured to split the first radiation beam into a first plurality of sub-beams, a second radiation source configured to provide a second radiation beam, at least one further splitter con...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	RILPHO LUDOVICUS DONKER, ERIK ROELOF LOOPSTRA, HAN-KWANG NIENHUYS, VADIM YEVGENYEVICH BANINE, WILFRED EDWARD ENDENDIJK
Format:	Patent
Sprache:	dut ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY DEVICES USING STIMULATED EMISSION ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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